Advanced Wafer Bumping
Redistribution Solutions
Unisem provides comprehensive wafer bumping and wafer-level processing services for 100mm, 150mm, and 200mm wafers, supported by controlled Class 100, Class 1,000, and Class 10,000 cleanroom environments. Our advanced capabilities support a wide range of semiconductor packaging and interconnect requirements, including Gold Bumping, Electroplated Solder Bumping, Copper Pillar Bumping, Large Solder Bumping, Passivation, and Redistribution.
With in-house photomask and stencil design capabilities, we provide greater process control, shorter lead times, and flexible solutions to meet demanding customer requirements.
Gold Bumping
Reliable interconnects
for wire bonding
and flip-chip applications.
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Lead-free and
eutectic solder solutions tailored
to diverse requirements.
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For Next-Generation Semiconductor
Reliable interconnects for wire bonding and flip-chip applications.
Miniature gold interconnects for semiconductors
Gold bumps are conductive interconnects used in flip chip and wafer level packaging, enabling high density electrical connections in semiconductors. Made via electroplating, gold bumps offer superior conductivity, corrosion resistance and mechanical stability compared to solder based alternatives. Due to fine pitch capability and thermal management benefits, gold bumps are essential in advanced miniaturized electronics.
UAT offers advanced gold bumping solutions for both 200mm & 300mm wafers. Our 200mm process utilizes a reliable TiW/Au stack while the 300mm platform features a robust Cu/Ni/Au stack.
Gold bumping using a TiW/Au (Titanium-Tungsten/Gold) stack is a proven and robust wafer-level interconnect technology widely used in flip-chip and chip-on-film (COF) applications. This metallization scheme provides excellent adhesion, conductivity, and corrosion resistance, making it ideal for precision devices requiring consistent electrical performance and long-term reliability.
For larger wafer sizes and more demanding applications, UAT also offers a Cu/Ni/Au (Copper/Nickel/Gold) bump stack. This structure leverages a copper core for superior electrical performance, a nickel barrier layer to prevent diffusion, and a gold top layer to ensure excellent solderability and oxidation resistance. The Cu/Ni/Au stack is optimized for high-density, fine-pitch designs and is particularly well-suited for 300mm wafer processing, delivering enhanced mechanical strength and long-term reliability for advanced packaging needs.
Electroplated solder bumping is a precision wafer-level interconnect technology where solder is deposited via electroplating onto under-bump metallization (UBM) pads. This method offers excellent control over bump height, uniformity, and alloy composition—making it ideal for high-density, fine-pitch applications and advanced flip-chip packaging.
UAT offers plated solder bumping on 150mm, 200mm and 300mm wafers, using pure tin (Sn) and tin-silver (SnAg) solder alloys to meet a variety of customer and reliability requirements. Our electroplating process delivers consistent solder volume, strong adhesion, and robust bump integrity after reflow. With tight process control and in-line inspection, UAT ensures high-yield, high-reliability solder interconnects for cutting-edge semiconductor devices.
High-density, high-performance interconnects for next-generation devices